Geni Tech Inc.

Genitech, Inc. was founded in 1996 by the researchers formerly with
Electronics & Telecommunic
ations Research Institute (ETRI), located in
Daedok Valley, Daejon Korea. The founders of Genitech, Inc. have extensive <
br>experiences in semiconductor processes including device designs and equipment.
In fact, they did vital roles during the
early phases of development of
CMOS-technology-based 4M DRAM designs and processes as a government-sponsored
project
at ETRI, which is recognized to be the major contributing factors to
the enormously successful and flourishing DRAM indus
try today in Korea.

Genitech's primary goal is to develop semiconductor process technologies for
the next generat
ion semiconductor manufacturing and beyond.

Genitech's staff members consist of engineers and scientists with Ph.D. an
d
master's degree in physics, chemistry, materials science, electrical engineering,
chemical engineering, and mechani
cal engineering.

Since its inception in 1996, Genitech has been developing advanced technologies
in the following
three major area.

Plasma enhanced atomic layer deposition (PEALD) tool which solves the limitations
of current g
eneration ALD tool.
Superfill CVD for Cu interconnection which enables dry process of Cu deposition
known to be possi
ble only by wet electroplating.
A unique and highly accurate chemical mechanical polishing (CMP) tool, UNIPLA CMP?
Ge
nitech signed a joint development agreement with ASM International in October 2001.